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Nanodevice Engineering & Lithography

Precision fabrication of single-nanorod FETs and custom 5-probe architectures using EBL, Photolithography, and FIB.

The Engineering Challenge

To understand the intrinsic transport properties of novel materials, we must move beyond bulk pellets. The challenge lies in making electrical contact with single nanostructures (sub-100nm diameter) without introducing contact resistance or geometric artifacts.

My Mission: To engineer device architectures that isolate the intrinsic physics of the material—whether it is a single perovskite nanorod or a micro-crystal for Hall measurement.


Innovation 1: Single Nanorod FETs (Thesis Work)

In my doctoral research, I synthesized high-aspect-ratio LaKMnO$_3$ (LKMO) nanorods using a dynamic hydrothermal method. To prove their utility in electronics, I fabricated single-nanorod Field Effect Transistors (FETs).

  • Fabrication: 1. Dispersal: Nanorods dispersed on $Si/SiO_2$ (300nm oxide) with alignment markers. 2. EBL Patterning: Used Electron Beam Lithography to define Source/Drain contacts on a single 86nm-radius rod. 3. Result: The device showed p-type semiconductor behavior with an Inverse-‘S’ shaped I-V curve, confirming its potential for neuromorphic computing.
  • Key Metric: Calculated carrier mobility ($\mu$) using the transconductance ($g_m$) from the linear region of the $I_d-V_g$ curve.

Innovation 2: The “5-Probe” Hall Architecture

For larger micro-crystals (~15$\mu$m), standard 4-probe methods suffer from voltage mixing ($R_{xx}$ vs $R_{xy}$) due to misalignment. I solved this by engineering a 5-Probe Asymmetric Device using a hybrid workflow.

  • Technique: Photolithography + FIB-SEM.
  • Process:
    1. Photolithography: Defined the coarse contact pads and leads on the substrate.
    2. Focused Ion Beam (FIB): Used Gallium ions to precisely deposit Platinum (Pt) “straps” connecting the specific facets of the microcube to the leads.
  • The Logic: The 5th probe (asymmetric arm) allows for the simultaneous decoupling of Longitudinal Resistance ($R_{xx}$) and Hall Voltage ($R_{xy}$), providing artifact-free carrier density data.

Visual Methodology

5-Probe Device
Figure 1: 5-Probe Hall Architecture (FIB-SEM)
Nanorod FET
Figure 2: Single Nanorod FET (Thesis)
EBL System
Figure 3: Lithography Workflow
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